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Other articles related with "reaction diffusion (RD)"：
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108503 |
Yan Zeng(曾严), Xiao-Jin Li(李小进), Jian Qing(卿健), Ya-Bin Sun(孙亚宾), Yan-Ling Shi(石艳玲), Ao Guo(郭奥), Shao-Jian Hu(胡少坚) |
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Detailed study of NBTI characterization in 40-nm CMOS process using comprehensive models |
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Chin. Phys. B
2017 Vol.26 (10): 108503-108503
[Abstract]
(631)
[HTML 1 KB]
[PDF 701 KB]
(265)
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